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Antireflection coating for ultraviolet light at large angels of incidence

机译:大入射角下的紫外线减反射膜

摘要

Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.
机译:提出仅具有三层或四层的抗反射多层涂层用于生产抗激光光学元件,该光学元件具有最小的残留反射和对波长大约为2-10nm的紫外线具有高透明度。 150 nm至约大入射角约250 nm。 70度到大约80°,特别是在大约80° 72°和大约。 76°。对于入射的p偏振UV光,可以使用三层系统,其中在两层高折射材料之间设置一层低折射材料,特别是氟化镁,在指定波长的情况下,该层具有最小吸收材料,特别是氧化ha或氧化铝。例如,在波长为248 nm时,入射角在大约1至2之间的范围内,这可以实现小于1%的残留反射。 72°和大约。 76°。

著录项

  • 公开/公告号US2004174587A1

    专利类型

  • 公开/公告日2004-09-09

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号US20040768665

  • 发明设计人 RALF KUSCHNEREIT;HANS-JOCHEN PAUL;

    申请日2004-02-02

  • 分类号G02B1/00;G02B5/08;G02B5/20;F21V9/06;F21V9/04;

  • 国家 US

  • 入库时间 2022-08-21 23:21:08

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