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Application of dense plasmas generated at atmospheric pressure for treating gas effluents

机译：大气压下产生的致密等离子体在处理废气中的应用

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摘要

The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) thereof the outlet is at a pressure substantially equal to atmospheric pressure, means (8), at the pump output, to produce a plasmas at atmospheric pressure.

机译：本发明涉及一种用等离子体处理诸如PFC或HFC之类的气体的系统，该系统包括：（ 6 ）泵装置（ 6 ），其出口的压力基本上等于大气压力，是指在泵的输出端（ 8 ）在大气压力下产生等离子体的装置。 展开▼

著录项

公开/公告号US2004195088A1

专利类型

公开/公告日2004-10-07

原文格式PDF

申请/专利权人 ROSTAING JEAN-CHRISTOPHE E;GUERIN DANIEL;LARQUET CHRISTIAN;LY CHUN-HAO;MOISAN MICHEL;DULPHY HERVE;
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申请/专利号US20040478596

发明设计人 DANIEL GUERIN;CHUN-HAO LY;HERVE DULPHY;MICHEL MOISAN;CHRISTIAN LARQUET;JEAN-CHRISTOPHE E ROSTAING;
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申请日2004-05-17

分类号B01J19/08;

国家 US

入库时间 2022-08-21 23:20:18

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