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Electroplated magnetic thin film, method of manufacturing the same, electroplating bath and thin film magnetic head

机译:电镀磁性薄膜,其制造方法,电镀浴和薄膜磁头

摘要

An electroplated magnetic thin film consisting of an electroplated film of Fe—Co alloy containing Fe by an amount of 52-86 wt % and having a highly packed fine crystal grain structure, a flat and glossy surface, a high saturation magnetic flux density not less than 2.1 T, a low coercive force of 5-10 Oe, and being particularly suitable as a pole portion of a thin film magnetic head is proposed. The electroplated magnetic thin film is deposited on a substrate by an electroplating process with a pulsatory current or direct current having a current density of 3-120 mA/cm while using an electroplating bath containing one or both of sulfate salt and hydrochloric salt serving as supply sources of Fe ions and Co ions, saccharin sodium serving as a stress relaxation agent by an amount not less than 1 g/l, boric acid as a pH buffer agent, ammonium chloride as an electrically conductivity salt, and sodium lauryl sulfate as a surfactant.
机译:由Fe-Co合金的电镀膜组成的电镀磁性薄膜,其中的Fe含量为52-86wt%,并且具有高堆积的细晶粒结构,平坦而有光泽的表面,高饱和磁通密度提出了小于2.1T的5-10Oe的低矫顽力,并且特别适合用作薄膜磁头的磁极部分。通过使用具有硫酸盐和盐酸盐中的一种或两种的硫酸盐作为电镀液的电镀浴,以电流密度为3-120 mA / cm的脉动电流或直流电通过电镀工艺将磁性镀膜沉积在基板上。铁离子和钴离子的来源,糖精钠作为应力松弛剂的量不少于1 g / l,硼酸作为pH缓冲剂,氯化铵作为电导盐,十二烷基硫酸钠作为表面活性剂。

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