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METHOD FOR QUANTIFYING UNIFORMITY PATTERNS AND INCLUDING EXPERT KNOWLEDGE FOR TOOL DEVELOPMENT AND CONTROL
METHOD FOR QUANTIFYING UNIFORMITY PATTERNS AND INCLUDING EXPERT KNOWLEDGE FOR TOOL DEVELOPMENT AND CONTROL
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机译:统一性模型的量化方法及包括工具开发和控制的专家知识的方法
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摘要
A system and method of for determining multiple uniformity metrics of a semiconductor wafer manufacturing process includes collecting a quantity across each one of a group of semiconductor wafers. The collected quantity data is scaled and a principal component analysis (PCA) is performed on the collected, scaled quantity data to produce a first set of metrics for the first group of semiconductor wafers. The first set of metrics including a first loads matrix and a first scores matrix.
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