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METHOD FOR QUANTIFYING UNIFORMITY PATTERNS AND INCLUSION OF EXPERT KNOWLEDGE FOR TOOL DEVELOPMENT AND CONTROL

机译:统一性模型的量化方法及工具开发与控制的专家知识

摘要

A kind of system and method, a kind of amount including collection about each semiconductor wafer in one group of semiconductor wafer of multiple uniformity metric values of determining semiconductor wafer manufacturing process. The data volume of collection is that calibration and principal component analysis (PCA) are collected, proportional amount data, is used for first group of semiconductor wafer to generate first group of measurement. First group of metric includes the first load matrix and one first score matrix.
机译:一种系统和方法,一种量,包括关于确定半导体晶片制造工艺的多个均匀性度量值的一组半导体晶片中的每个半导体晶片的收集。收集的数据量是收集校准和主成分分析(PCA)的比例量数据,用于第一组半导体晶片以生成第一组测量值。第一组度量包括第一负载矩阵和一个第一得分矩阵。

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