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METHOD FOR QUANTIFYING UNIFORMITY PATTERNS AND INCLUSION OF EXPERT KNOWLEDGE FOR TOOL DEVELOPMENT AND CONTROL

机译:统一性模型的量化方法及工具开发与控制的专家知识

摘要

System and method for determining a plurality of uniformity metrics of a semiconductor wafer manufacturing process is a semiconductor wafer It includes collecting a quantity across each of the groups. The amount of data collected and the scale, to generate a first set of metrics for the first group of semiconductor wafers, principal component analysis (PCA) is performed on the data in the scaled amount are collected. The first set of metrics includes a first loads matrix and a first scores matrix.
机译:用于确定半导体晶片制造工艺的多个均匀性度量的系统和方法是一种半导体晶片。该系统和方法包括跨每个组收集数量。为了收集用于第一组半导体晶片的第一组度量,收集的数据量和比例尺,对按比例缩放的量的数据执行主成分分析(PCA)。第一组度量包括第一负载矩阵和第一分数矩阵。

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