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METHOD FOR A PLAN-VIEW TRANSMISSION ELECTRON MICROSCOPY SAMPLE PREPARATION TECHNIQUE FOR VIA AND CONTACT CHARACTERIZATION

机译:平面和透射特性的透射电子显微镜样品制备方法

摘要

A method for preparing a transmission electron microscopy (TEM) sample for contact and via characterization. Specifically, one embodiment of the present invention discloses a method where an integrated circuit semiconductor chip (IC chip) is bonded to a piece of glass and attached to a sample holder. Areas of the IC chip are removed by polishing until a region surrounding a particular contact or via is exposed. The piece of glass supports the IC chip during the polishing process. The IC chip is cut using a focused ion beam to create a thin membrane suitable for TEM failure analysis. The thin membrane includes a plan-view cross-section from the particular contact or via. The cross-sectional plan-view is perpendicular to the longitudinal axis of the contact or via.
机译:一种制备用于接触和通过表征的透射电子显微镜(TEM)样品的方法。具体地,本发明的一个实施例公开了一种方法,其中将集成电路半导体芯片(IC芯片)结合到一块玻璃上并附着到样品架上。通过抛光去除IC芯片的区域,直到暴露出特定触点或通孔周围的区域。一块玻璃在抛光过程中支撑着IC芯片。使用聚焦离子束切割IC芯片,以形成适用于TEM故障分析的薄膜。薄膜包括来自特定触点或通孔的平面截面。横截面平面图垂直于触点或通孔的纵轴。

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