Diamond-type carbon film coater for, e.g., steel includes a sputtering magnetron with, e.g., tungsten physical vapor deposition with argon and methane based plasma generation

摘要

The diamond-type carbon film coater for, e.g., steel has a sputtering magnetron for physical vapor deposition (PVD) of tungsten, tungsten carbide and carbon multi-layer coating. The process employs a binary tungsten and carbon (99.99 per cent each) material with progressive variation of the methane concentration in the argon-CH4 mixture in the plasma generation chamber. An Independent claim is given for a process using the coater.