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Deposition of Tungsten Thin Films by Magnetron Sputtering for Large-Scale Production of Tungsten-Based Transition-Edge Sensors

机译：通过磁控溅射沉积钨薄膜，用于大规模生产钨基过渡边缘传感器

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A. H. Abdelhameed; G. Angloher; P. Bauer; A. Bento; E. Bertoldo; L. Canonica; D. Fuchs; D. Hauff; N. Ferreiro Iachellini; M. Mancuso; F. Petricca; F. Pröbst; J. Riesch; J. Rothe;
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1. Effect of film deposition rate on the thermoelectric output of tungsten-rhenium thin film thermocouples by DC magnetron sputtering [J] . Journal of Micromechanics and Microengineering . 2020,第6期

机译：薄膜沉积速率对DC磁控溅射钨 - 铼薄膜热电偶热电输出的影响
2. Deposition of thermally stable tungsten nitride thin films by reactive magnetron sputtering [J] . Abdelhameed A. H., Jacob W. Surface & Coatings Technology . 2019,第期

机译：通过反应磁控溅射沉积热稳定的钨氮化物薄膜
3. Deposition of Tungsten Thin Films on Flexible Polymer Substrates by Direct-Current Magnetron Sputtering [J] . Zhang Rui, Huo Zhenxuan, Jiao Xiangquan, Journal of Electronic Materials . 2015,第11期

机译：直流磁控溅射在柔性聚合物基体上沉积钨薄膜
4. Deposition of Tungsten-Doped V_2O_5 Thin Films on Non-Alkali Glass Substrate by RF Magnetron Sputtering for Thermal Insulation [C] . Yue-Fei Zhang, Chun-Yao Hsu, Chili-Chung Hu Cross-Strait Conference on Engineering Materials . 2017

机译：RF磁控溅射在非碱玻璃基板上沉积钨掺杂的V_2O_5薄膜，用于保温
5. Chemical vapor deposition of tungsten-based diffusion barrier thin films for copper metallization. [D] . Kim, Dojun. 2009

机译：用于铜金属化的钨基扩散阻挡薄膜的化学气相沉积。
6. Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering [O] . Zhongkai Zhang, Bian Tian, Yan Liu, 2019

机译：射频磁控溅射碳化硅和钨hen基薄膜热电偶保护涂层的热电特性
7. Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering [O] . Sønderby, Steffen, Aijaz, Asim, Helmersson, Ulf, 2014

机译：大功率脉冲磁控溅射和脉冲磁控溅射沉积钇稳定的氧化锆薄膜

Deposition of Tungsten Thin Films by Magnetron Sputtering for Large-Scale Production of Tungsten-Based Transition-Edge Sensors

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