首页>
外国专利>
Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables
Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables
展开▼
机译:缺陷检查方法,包括为不同的光刻工艺变量获取标线的航拍图像
展开▼
页面导航
摘要
著录项
相似文献
摘要
Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images corresponding to at least two of the different values. A different method includes comparing at least one pair of the aerial images corresponding to at least two of the different values and determining an area on the reticle where a lithography process using the reticle is most susceptible to failure based on the results of the comparison. Another embodiment includes determining a presence of transient repeating defects on the reticle by subtracting non-transient defects from the aerial images and comparing at least one pair of the aerial images corresponding to at least two of the different values.
展开▼