CONTROL OF FILM GROWTH USING AUGER ELECTRON SPECTROSCOPY FOR MEASURING FILM THICKNESS AND CHEMICAL COMPOSITION

摘要

Apparatus for analysis of a thin film formed over an underlying layer on a surface of a sample, the thin film including first elements, while the underlying layer includes second elements. The apparatus includes an electron gun, which directs a beam of electrons to impinge on a point on the surface of the sample at which the thin film is formed. An electron detector receives Auger electrons emitted by the first and second elements responsive to the impinging beam of electrons, and to output a signal indicative of a distribution of energies of the emitted electrons. A controller receives the signal and analyzes the distribution of the energies so as to determine a composition of the first elements in the thin film and a thickness of the thin film. Furthermore, the controoler adjusts in response to the determinated composition and thickness an operating parameter of a deposition station adapted to form the thin film.