首页> 外国专利> METHOD FOR DETERMINING A HIGH-REFLECTION CUT OF A GEM, METHOD FOR CUTTING A HIGH-REFLECTION GEM, AND THE CUT HIGH-REFLECTION GEM

METHOD FOR DETERMINING A HIGH-REFLECTION CUT OF A GEM, METHOD FOR CUTTING A HIGH-REFLECTION GEM, AND THE CUT HIGH-REFLECTION GEM

机译:确定高反射率宝石的方法,高反射率宝石的方法和高反射率宝石的方法

摘要

The invention relates to a method for determining a high-reflection cut of a gem, a method for cutting a high-reflection gem, and a cut high-reflection gem. According to the invention, the gems have at least three lower part main facets and at least three upper part main facets, the angle between the lower part main facets and the girdle plane being greater than the angle between the upper part main facets and the girdle plane. A table replaces the upper part main facets at an angle of 0°. The lower part main facet angle is between 41° and 46° and the upper part main facet angle corresponds to an angle from a group of predetermined preferred angles. The group of angles is determined according to the average refraction of light n (between 1.50 and 3.00) of the raw material being cut and the lower part main facet angle.
机译:确定宝石的高反射率切割的方法,切割高反射率的宝石的方法和切割高反射率的宝石的方法技术领域根据本发明,宝石具有至少三个下部主刻面和至少三个上部主刻面,下部主刻面与腰围平面之间的角度大于上部主刻面与腰围之间的角度。飞机。桌子以0°的角度替换上部主面。下部主刻面角度在41°至46°之间,并且上部主刻面角度对应于一组预定的优选角度中的角度。角度组是根据被切割原料的光n(在1.50和3.00之间)的平均折射和下部主刻面角度确定的。

著录项

  • 公开/公告号EP1001690B1

    专利类型

  • 公开/公告日2004-10-27

    原文格式PDF

  • 申请/专利权人 BUERGER HELMUT;

    申请/专利号EP19980938714

  • 发明设计人 BUERGER HELMUT;

    申请日1998-07-30

  • 分类号A44C17/00;

  • 国家 EP

  • 入库时间 2022-08-21 22:57:29

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