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METHOD FOR DETERMINING A HIGH-REFLECTION CUT OF A GEM, METHOD FOR CUTTING A HIGH-REFLECTION GEM, AND THE CUT HIGH-REFLECTION GEM
METHOD FOR DETERMINING A HIGH-REFLECTION CUT OF A GEM, METHOD FOR CUTTING A HIGH-REFLECTION GEM, AND THE CUT HIGH-REFLECTION GEM
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机译:确定高反射率宝石的方法,高反射率宝石的方法和高反射率宝石的方法
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摘要
The invention relates to a method for determining a high-reflection cut of a gem, a method for cutting a high-reflection gem, and a cut high-reflection gem. According to the invention, the gems have at least three lower part main facets and at least three upper part main facets, the angle between the lower part main facets and the girdle plane being greater than the angle between the upper part main facets and the girdle plane. A table replaces the upper part main facets at an angle of 0°. The lower part main facet angle is between 41° and 46° and the upper part main facet angle corresponds to an angle from a group of predetermined preferred angles. The group of angles is determined according to the average refraction of light n (between 1.50 and 3.00) of the raw material being cut and the lower part main facet angle.
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