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An optoelectronic device doped to augment an optical power threshold for bandwidth collapse and a method of manufacturing therefor

机译:掺杂以增加用于带宽崩溃的光功率阈值的光电子器件及其制造方法

摘要

An improved optoelectronic device and a method of manufacture therefor. The optoelectronic device includes a doped buffer layer (320) located over a substrate (310) having an optical window (315) formed therein and an absorber layer (330) located over the doped buffer layer (320). The optoelectronic device further includes a doped region (350) located over the absorber layer (330) and having a dopant tail (355) that extends substantially through the absorber layer (330), and the doped buffer layer (320) and the dopant tail (355) are doped to augment an optical power threshold for bandwidth collapse of the optoelectronic device.
机译:改进的光电装置及其制造方法。该光电器件包括位于衬底(310)上方的掺杂缓冲层(320),该衬底具有形成在其中的光学窗口(315),以及位于掺杂缓冲层(320)上方的吸收体层(330)。光电器件还包括位于吸收层(330)上方并具有基本上延伸穿过吸收层(330)的掺杂剂尾部(355)的掺杂区(350),掺杂缓冲层(320)和掺杂剂尾部(355)被掺杂以增加光功率阈值以用于光电子设备的带宽崩溃。

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