Combined coating process using high-rate magnetic field assisted sputtering and unbalanced magnetron

摘要

A PVD method for the coating of substrates, wherein the substrate is pre-treated in the vapor of a pulsed magnetic field-supported cathode sputtering, during the pretreatment to the magnetic support a magnetic field arrangement in the manner of the magnetron cathode is used with a strength of the horizontal component in front of the target of 100 to 1500 Gauss, after the pretreatment is carried out a further coating by means of cathode sputtering and the power density of the pulsed discharge in the pretreatment than 1000 W.cm ^-2.