APPARATUS AND MEASUREMENT PROCEDURE FOR THE FAST, QUANTITATIVE, NON-CONTACT TOPOGRAPHIC INVESTIGATION OF SEMICONDUCTOR WAFERS AND OTHER MIRROR LIKE SURFACES

摘要

the object of the invention is, on the one hand, and mu00e1stu00fcku00f6rjellegu0171 surfaces of semiconductor wafers u00e9rintu00e9smentes, fast quantitative measurement system which is suitable for topogru00e1fiaivizsgu00e1latu00e1ra, 4.figure szerintu00e1bru00e1zolt manner, point light source, the light source (1) and the fu00e9nyu00e9tpu00e1rhuzamosu00edtu00f3 kollimu00e1lt beam of light to the test area vetu00edtu0151homoru00fa mirror (4),the light source and the mirror elhelyezettstrukturu00e1lt between mask patterns (3) and the test surface.then, the concave mirror in the path of beam of light reflected eztku00f6vetu0151en helyezettku00e9pu00e9rzu00e9kelu0151 contains sensor (6).the szenzorhoz suitable interface (7) is connected by means of a computer (8), (9) which, on the one hand, ahozzu00e1csatlakozu00f3 monitor displays the sensor by u00e9rzu00e9keltku00e9pet,on the other hand, suitable for maszkku00e9pelemeinek algorithm determines the sensor surface formed in a position.the invention tu00e1rgyamu00e1sru00e9szt measurement procedure, which in the above described arrangement u00e9salkalmas algorithm fu00e9lvezetu0151szeletek and other tu00fcku00f6rjellegu0171felu00fcletek u00e9rintu00e9smentes,a rapid quantitative topographical vizsgu00e1latu00e1raalkalmas.the essence of the invention is that the mask and the other element relative to the position of the szenzornak i got elected to the mask essentially sharp optical image of aszenzoron appear.the advantage of atalu00e1lmu00e1ny increased lateral resolution, accuracy u00e9sdinamikai province. oh