PHOTOACID GENERATOR FOR CHEMICAL AMPLIFICATION RESIST MATERIAL, RESIST MATERIAL USING THE GENERATOR AND PATTERN FORMATION METHOD

摘要

PURPOSE: A photoacid generator for a chemical amplification resist material containing the photoacid generator and a pattern formation method using the resist material are provided, to improve resolution, focus latitude and pattern profile shape after development and to reduce the variation in line widths and the deterioration in shapes even on long-term post-exposure bake. CONSTITUTION: The photoacid generator is represented by the formula 1, wherein R's are identical or different one another and are H, F, Cl, a nitro group or a linear, branched or cyclic and substituted or unsubstituted alkyl or alkoxy group of C1-C12; n is 0 or 1; m is 1 or 2; r is an integer of 0-4; r' is an integer of 0-5; k is an integer of 0-4; G' and G'' are S or -CH=CH-, respectively but G' and G'' are not S at the same time. The chemical amplification resist material comprises a resin whose solubility in an alkali developer changes by the action of an acid; and the photoacid generator of the formula 1.