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Wafer holder for ultra-high temperature process wafer loading boat and ultra-high temperature furnace having the wafer holder

机译:用于超高温工艺晶圆装载船的晶圆支架以及具有该晶圆支架的超高温炉

摘要

PURPOSE: A semiconductor substrate holder for an ultrahigh temperature is provided to prevent a semiconductor substrate from being warped in a high temperature process and avoid a process loss of the semiconductor substrate by installing an additional substrate support part in each slot so as to support the lower part of the semiconductor substrate. CONSTITUTION: The substrate holder(11) is mounted on a substrate loading boat(10) for loading the semiconductor substrate(100) into a high-temperature heat treatment apparatus with a vertical reaction tube(40). The semiconductor substrate is placed on a plate-type support main body. A substrate support part for partially supporting the semiconductor substrate is included in the substrate support main body.
机译:目的:提供用于超高温的半导体衬底支架,以防止半导体衬底在高温工艺中翘曲,并通过在每个插槽中安装一个额外的衬底支撑部件以支撑下层,从而避免半导体衬底的工艺损失。半导体衬底的一部分。组成:基板支架(11)安装在基板装载舟皿(10)上,用于将半导体基板(100)装载到带有垂直反应管(40)的高温热处理设备中。半导体基板被放置在板状支撑主体上。在基板支撑主体中包括用于部分支撑半导体基板的基板支撑部。

著录项

  • 公开/公告号KR20040023963A

    专利类型

  • 公开/公告日2004-03-20

    原文格式PDF

  • 申请/专利权人 TERASEMICON CORPORATION;

    申请/专利号KR20020055421

  • 发明设计人 NA GI JEONG;PARK SEUNG GAP;

    申请日2002-09-12

  • 分类号H01L21/68;

  • 国家 KR

  • 入库时间 2022-08-21 22:49:31

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