首页> 外国专利> RAPID CYCLE CHAMBER HAVING A TOP VENT WITH NITROGEN PURGE

RAPID CYCLE CHAMBER HAVING A TOP VENT WITH NITROGEN PURGE

机译:快速循环室的顶部排气口带有氮气吹扫装置

摘要

A chamber for transitioning a semiconductor substrate between modules operating at different pressures is provided. The chamber includes a base defining an outlet. The outlet permits removal of an atmosphere within the chamber to create a vacuum. A substrate support for supporting a semiconductor substrate within the chamber is included. A chamber top having an inlet is included. The inlet is configured to allow for the introduction of a gas into the chamber to displace moisture in a region defined above the substrate support. Sidewalls extending from the base to the chamber top are included. The sidewalls include access ports for entry and exit of a semiconductor substrate from the chamber. A method for conditioning an environment above a region of a semiconductor substrate within a pressure varying interface is also provided.
机译:提供了用于在不同压力下操作的模块之间过渡半导体衬底的腔室。该腔室包括限定出口的底部。出口允许去除腔室内的气氛以产生真空。包括用于在腔室内支撑半导体衬底的衬底支撑件。包括具有入口的腔室顶部。入口构造成允许将气体引入腔室中以在基板支撑件上方限定的区域中置换水分。包括从底部延伸到腔室顶部的侧壁。侧壁包括用于使半导体衬底从腔室进入和离开腔室的进入端口。还提供了一种用于在变压界面内的半导体衬底的区域上方调节环境的方法。

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