HIGH CAPACITY PLASMA EQUIPMENT HAVING PLASMA MONITOR, HIGH CAPACITY PLASMA EQUIPMENT HAVING ANALYSIS MODULE, AND METHOD FOR USING THE SAME

摘要

PURPOSE: A high capacity plasma equipment having a plasma monitor, a high capacity plasma equipment having an analysis module, and a method for using the same are provided to be capable of improving the uniformity for the generation of plasma in a process chamber and reducing the maintenance cost of an optical cable. CONSTITUTION: A high capacity plasma equipment is provided with at least one process chamber(20) having a lower electrode, magnetic field generation parts(30,34,36,38) at the upper portions of the process chamber, and plasma monitor parts(55,65,75,85) at the lateral portions of the process chamber. The plasma monitor part includes light capture windows and light monitor parts. The high capacity plasma equipment further includes a frequency controller(90) connected to the plasma monitor parts, and frequency generation parts(100,110,120,130). The frequency generation parts are connected with the magnetic field generation parts, respectively. Wires and an optical cable are used for connecting the parts with each other.