PHOTOSENSITIVE RESIN COMPOSITION CONTAINING A CATALYTIC METAL ELEMENT WITH A METAL-DEPOSITION CATALYTIC ACTIVITY SUITABLE FOR ELECTROLESS METAL PLATING AND METHOD FOR THE FORMATION OF A RESIN PATTERN USING THE COMPOSITION

摘要

PURPOSE: Provided are a photosensitive resin composition, characterized by containing, as a catalyst precursor, an organic compound which contains a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating and a method for the formation of a conducting layer selectively on a resin pattern by coating the resin composition on a substrate, followed by exposure and development. CONSTITUTION: The photosensitive resin composition comprises, as a catalyst precursor, an organic compound containing a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating, wherein the catalyst precursor is a metal salt of one or more of an alkyl carboxylic acid, alkenyl carboxylic acid, and alkynyl carboxylic acid, wherein the catalytic metal element is chosen from palladium, silver, platinum, ruthenium, rhodium, and indium, and wherein the composition further comprises an epoxy compound and a resin material selected from polyvinylphenol, novolac resin, and a mixture thereof. In a method for the formation of a resin pattern with a metal-deposition catalytic activity suitable for electroless metal plating, the method comprises the steps of: coating the photosensitive resin composition on a substrate; exposing and developing the photosensitive resin composition to form a resist pattern; treating the resist pattern to convert the catalyst precursor present in the resin pattern to a catalyst; and activating the resin pattern surface. In a method for the formation of a resin pattern with a metal-deposition catalytic activity suitable for electroless metal plating, the method comprises the steps of: coating the photosensitive resin composition on a substrate, the substrate being previously coated with an acid-containing primer resin pattern; heating the photosensitive resin composition to form a resist pattern; treating the photosensitive resin composition to convert the catalyst precursor present in the resin pattern to a catalyst; and activating the resin pattern surface.