首页> 外国专利> DEVICE MANUFACTURING METHOD FOR PROVIDING MAXIMIZED THROUGHPUT AND PRODUCING DEVICE OF HIGH QUALITY, DEVICE OBTAINED THEREBY, AND COMPUTER PROGRAM, LITHOGRAPHIC APPARATUS, ROBOT ENGINEERING SYSTEM AND OPTIMAL TIME VALUE CALCULATOR FOR IMPLEMENTING THE SAME METHOD

DEVICE MANUFACTURING METHOD FOR PROVIDING MAXIMIZED THROUGHPUT AND PRODUCING DEVICE OF HIGH QUALITY, DEVICE OBTAINED THEREBY, AND COMPUTER PROGRAM, LITHOGRAPHIC APPARATUS, ROBOT ENGINEERING SYSTEM AND OPTIMAL TIME VALUE CALCULATOR FOR IMPLEMENTING THE SAME METHOD

机译:提供最大产量和生产高质量设备的设备制造方法,所获得的设备以及计算机程序,光刻设备,机器人工程系统和实现该方法的最佳时间值计算器

摘要

PURPOSE: Provided are a device manufacturing method, which gives the maximized throughput and produces devices of high quality in a systematic way, and a device obtained by the method. CONSTITUTION: The device manufacturing method comprises the steps of: providing radiation beams(6) by using a radiation system(4); projecting the radiation beams(6) onto a radiation-sensitive substrate(10); and assigning a locus of movement to the radiation beams including the position and/or direction followed by the substrate(10) as a function of time. In the method, the locus is a mathematically even function up to at least the third order connecting a first state to a second state. Both of the first and the second states include at least the boundary values to the position and/or direction, and the boundary values to the primary and secondary derivatives of the position and/or direction. The method further comprises a step of assigning a locus for making the shortest connection between the first state and the second state, wherein the primary, secondary and the tertiary derivatives are controlled by predetermined values.
机译:目的:提供一种器件制造方法,其提供最大的产量并以系统的方式生产高质量的器件,以及通过该方法获得的器件。组成:该器件的制造方法包括以下步骤:通过使用辐射系统(4)提供辐射束(6);将辐射束(6)投射到对辐射敏感的基板(10)上;并根据时间为辐射束分配运动轨迹,包括基板(10)跟随的位置和/或方向。在该方法中,轨迹在数学上是偶数函数,直到至少将第一状态连接到第二状态的第三阶为止。第一状态和第二状态都至少包括位置和/或方向的边界值,以及位置和/或方向的一阶和二阶导数的边界值。该方法还包括分配用于在第一状态和第二状态之间建立最短连接的位置的步骤,其中,一阶,二阶和三阶导数由预定值控制。

著录项

  • 公开/公告号KR20040076616A

    专利类型

  • 公开/公告日2004-09-01

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号KR20040012094

  • 发明设计人 VANDERSANDE JORIS JAN;

    申请日2004-02-24

  • 分类号G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 22:48:08

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