Device manufacturing method,device manufactured thereby,computer program for performing the method,lithographic apparatus, and robotics system

摘要

The invention relates to a device manufacturing method comprising the steps of:providing a radiation beam using a radiation system;projecting the radiation beam onto a substrate of radiation sensitive material;specifying a trajectory comprising a position and/or an orientation as a function of time to be followed by the substrate relative to the radiation beam, wherein the trajectory is a mathematical smooth function up to at least the third order which connects a first state and a second state, wherein both the first state and the second state comprise boundary values for at least the position and/or the orientation and for first and second derivatives of the position and/or orientation.;Furthermore, the invention relates to a lithographic apparatus arranged for performing the method, and a software program arranged for performing the method.;The invention also relates to a robotics system arranged for specifying a trajectory to be followed between two elements of the system.