PHOTORESIST COMPOSITION FOR CIRCUIT OF LIQUID CRYSTAL DISPLAY DEVICE, METHOD FOR FORMING PHOTORESIST PATTERN FOR LCD USING THE COMPOSITION AND LCD CONTAINING THE PATTERN FORMED BY THE METHOD

摘要

PURPOSE: A photoresist composition for the circuit of a liquid crystal display (LCD) device, a method for forming a photoresist pattern for LCD using the composition and an LCD containing the pattern formed by the method are provided, to reduce the width of CD skew decrease of pattern after Cr etching, thereby improving production yield and productivity. CONSTITUTION: The photoresist composition comprises 10-25 wt% of a novolac resin having a molecular weight of 2,000-12,000; 0.5-6.5 wt% of an acryl resin having a molecular weight of 2,000-25,000 (whose amount is 5-25 wt% based on the amount of the total resin); 3-10 wt% of a diazide-based photosensitive compound; and the balance of an organic solvent. Preferably the diazide-based photosensitive compound is 2,3,4,4'-tetrahydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonate.