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SUBSTRATE PROCESS APPARATUS AND MAINTENANCE METHOD THEREOF TO REDUCE COST OF OWNERSHIP AND IMPROVE SUBSTRATE PROCESS EFFICIENCY
SUBSTRATE PROCESS APPARATUS AND MAINTENANCE METHOD THEREOF TO REDUCE COST OF OWNERSHIP AND IMPROVE SUBSTRATE PROCESS EFFICIENCY
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机译:用于降低拥有成本并提高基板处理效率的基板处理装置及其维护方法
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摘要
PURPOSE: A substrate process apparatus is provided to reduce cost of ownership and improve substrate process efficiency by making an elevation unit for elevating an upper cover built in the upper part of a chamber. CONSTITUTION: A receptacle body(16) is prepared. An upper cover(18) closes the upper opening of the receptacle body. A substrate process apparatus includes the receptacle body and a chamber having the upper cover. An elevation unit(14) for elevating the upper cover is formed in the upper part of the chamber as one body with the chamber. The elevation unit includes the first pole, a driver source and a power conversion unit(50). The first pole extends in a vertical direction, standing in the upper part of the receptacle body. The driver source outputs predetermined rotation force, formed in the upper cover. The power conversion unit converts the rotation force output from the driver source into vertical force for elevating the upper cover along the first pole.
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