首页> 外国专利> SUBSTRATE PROCESS APPARATUS AND MAINTENANCE METHOD THEREOF TO REDUCE COST OF OWNERSHIP AND IMPROVE SUBSTRATE PROCESS EFFICIENCY

SUBSTRATE PROCESS APPARATUS AND MAINTENANCE METHOD THEREOF TO REDUCE COST OF OWNERSHIP AND IMPROVE SUBSTRATE PROCESS EFFICIENCY

机译:用于降低拥有成本并提高基板处理效率的基板处理装置及其维护方法

摘要

PURPOSE: A substrate process apparatus is provided to reduce cost of ownership and improve substrate process efficiency by making an elevation unit for elevating an upper cover built in the upper part of a chamber. CONSTITUTION: A receptacle body(16) is prepared. An upper cover(18) closes the upper opening of the receptacle body. A substrate process apparatus includes the receptacle body and a chamber having the upper cover. An elevation unit(14) for elevating the upper cover is formed in the upper part of the chamber as one body with the chamber. The elevation unit includes the first pole, a driver source and a power conversion unit(50). The first pole extends in a vertical direction, standing in the upper part of the receptacle body. The driver source outputs predetermined rotation force, formed in the upper cover. The power conversion unit converts the rotation force output from the driver source into vertical force for elevating the upper cover along the first pole.
机译:目的:提供一种基板处理设备,以通过制造用于抬高内置在腔室上部的上盖的升降单元来降低拥有成本并提高基板处理效率。组成:准备了一个容器主体(16)。上盖(18)封闭了容器主体的上部开口。基板处理设备包括容器主体和具有上盖的腔室。用于升高上盖的升高单元(14)在室的上部与室一体形成。升降单元包括第一杆,驱动源和功率转换单元(50)。第一杆在竖直方向上延伸,直立在容器主体的上部中。驱动器源输出形成在上盖中的预定旋转力。动力转换单元将从驱动器源输出的旋转力转换为垂直力,以沿第一极抬高上盖。

著录项

  • 公开/公告号KR20040089477A

    专利类型

  • 公开/公告日2004-10-21

    原文格式PDF

  • 申请/专利权人 SUMITOMO HEAVY INDUSTRIES LTD.;

    申请/专利号KR20040021091

  • 发明设计人 TANAKA TOSHIHARU;IIO ITSUSHI;

    申请日2004-03-29

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:48

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