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How to handle the plasma electrode, and a workpiece for use in an ion implanter, said ion implanter that generates an ion beam to a ribbon beam
How to handle the plasma electrode, and a workpiece for use in an ion implanter, said ion implanter that generates an ion beam to a ribbon beam
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机译:如何处理等离子电极以及用于离子注入机的工件,所述离子注入机产生离子束至带状束
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摘要
A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.
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