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Production of dielectric layers used in the production of electronic components, e.g. transistors or capacitors, comprises preparing a substrate, forming a dielectric layer on the substrate, and subjecting the dielectric layer to a plasma
Production of dielectric layers used in the production of electronic components, e.g. transistors or capacitors, comprises preparing a substrate, forming a dielectric layer on the substrate, and subjecting the dielectric layer to a plasma
Production of dielectric layers having a high dielectric constant and low current leakage comprises preparing a substrate, forming a dielectric layer on the substrate, and subjecting the dielectric layer to a plasma.
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