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Epitaxial growth of an epitaxial material with silicon used in the production of semiconductor components comprises using a material containing nickel, silicon and aluminum
Epitaxial growth of an epitaxial material with silicon used in the production of semiconductor components comprises using a material containing nickel, silicon and aluminum
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机译:在半导体组件生产中使用硅对外延材料进行外延生长包括使用含有镍,硅和铝的材料
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摘要
Epitaxial growth of an epitaxial material with silicon comprises using a material having the composition: NiSi2-xAlx or NiSi2-xGax. An Independent claim is also included for a semiconductor component having a silicon layer and an epitaxial layer made from the composition: NiSi2-xAlx or NiSi2-xGax.
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