首页> 外国专利> Manufacture of exposed structures using exposure apparatus, by reading macro line data sets for lines being exposed from memory while further macro lines are written to memory

Manufacture of exposed structures using exposure apparatus, by reading macro line data sets for lines being exposed from memory while further macro lines are written to memory

机译:使用曝光设备制造曝光结构,方法是读取宏线数据集以从存储器中曝光的线,同时将其他宏线写入存储器

摘要

The method involves exposing a substrate body (28) in the region of a module within a number of macro-lines to form each of a number of identical structures. An exposure apparatus includes a number of light sources which are driven simultaneously by a controller with a memory from which data sets of macro lines being exposed are read while data sets of further macro lines are stored. An Independent claim is included for an apparatus for manufacturing exposed structures.
机译:该方法包括将基板主体(28)暴露在多个宏线内的模块区域中,以形成多个相同结构中的每一个。曝光设备包括多个光源,该多个光源由具有存储器的控制器同时驱动,从存储器中读取正在曝光的宏线的数据集,同时存储其他宏线的数据集。包括用于制造暴露结构的设备的独立权利要求。

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