Repairing quartz defects, especially quartz bumps, on alternating phase masks, employs both mechanical- and etching stages

摘要

To repair defects occurring on one and the same component, defect repair process stages are employed. These are based essentially on both mechanical- (S3) and on etching- (S2) processes. An Independent claim is included for the corresponding, repaired defective component, especially a photomask.