首页> 外国专利> Process for treating wafers comprises covering the front side of the wafer having components with a layer system consisting of a separating layer and a protective layer before the rear side of the wafer is coated

Process for treating wafers comprises covering the front side of the wafer having components with a layer system consisting of a separating layer and a protective layer before the rear side of the wafer is coated

机译:处理晶片的方法包括在涂覆晶片的背面之前,用由隔离层和保护层组成的层系统覆盖具有组件的晶片的正面。

摘要

Process for treating wafers comprises covering the front side of the wafer (1) having components (2) with a layer system consisting of a separating layer (3) and a protective layer (4). The wafer and the components are protected by the layer system during coating of the rear side of the wafer. An Independent claim is also included for a device for carrying out the process.
机译:处理晶片的方法包括用由隔离层(3)和保护层(4)组成的层系统覆盖具有组件(2)的晶片(1)的前侧。在涂覆晶片的背面期间,晶片和组件受到层系统的保护。还包括用于执行该过程的设备的独立权利要求。

著录项

  • 公开/公告号DE10256247A1

    专利类型

  • 公开/公告日2004-06-09

    原文格式PDF

  • 申请/专利权人 JAKOB ANDREAS;

    申请/专利号DE2002156247

  • 发明设计人 JAKOB ANDREAS;

    申请日2002-11-29

  • 分类号H01L21/68;H01L21/78;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:44

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