首页> 外国专利> Mixture of di-, tri- and other oligomeric phenazinium compounds, used in copper electroplating bath for decorative plating or plating circuit board or semiconductor substrate, is prepared from monomer by diazotization and boiling

Mixture of di-, tri- and other oligomeric phenazinium compounds, used in copper electroplating bath for decorative plating or plating circuit board or semiconductor substrate, is prepared from monomer by diazotization and boiling

机译:由单体通过重氮化和沸腾制得的二,三和其他低聚吩嗪化合物的混合物,用于装饰电镀或电镀电路板或半导体基板的铜电镀浴中

摘要

Mixture of oligomeric phenazinium compounds contains phenazinium compound(s) selected from compounds (I) with 2 monomer units (A), which are linked through positions 1-4 or 5-8 and optionally have different substituents, compounds (II) with 3 monomer units of this type and other oligomeric phenazinium compounds, with a total of not less than 80 mole-% (I) and (II). Mixture of oligomeric phenazinium compounds contains phenazinium compound(s) selected from compounds (I) with 2 monomer units of formula (A), optionally with different substituents, compounds (II) with 3 monomer units of this type and other oligomeric phenazinium compounds, with a total of not less than 80 mole-% (I) and (II): N(R5)CC(R4)C(R3) = a group of formula (IIIa) or (IIIb); R1-9 = H, halogen, amino, OH, CN, SCN, SH, COOH, COO-salt, COO-ester, SO3H, SO3-salt, SO3-ester or lower alkyl(hetero)aryl; or R1-4, R6-9 = a single bond connecting individual monomer units; or R2, R3 may = oxo, imino or methylene if (A) contains a (IIIb) unit; NCC(R1)C(R2) = a group of formula (IVa) or (IVb); A- = an acid anion Independent claims are also included for the following: (1) preparation of the mixture; (2) acid copper electroplating bath containing the mixture.
机译:低聚吩嗪鎓化合物的混合物包含选自具有两个单体单元(A)的化合物(I)的吩嗪鎓化合物,它们通过1-4或5-8位连接并且任选具有不同的取代基,化合物(II)具有3个单体(I)和(II)的总和不少于80摩尔%。低聚吩嗪化合物的混合物包含选自具有两个式(A)单体单元(任选具有不同取代基)的化合物(I),具有三个这种单体单元的化合物(II)和其他低聚吩嗪化合物的吩化合物(I)和(II)的合计为80摩尔%以上:N(R5)CC(R4)C(R3)=式(IIIa)或(IIIb)的基团。 R1-9 = H,卤素,氨基,OH,CN,SCN,SH,COOH,COO盐,COO酯,SO 3 H,SO 3盐,SO 3酯或低级烷基(杂)芳基;或R1-4,R6-9 =连接各个单体单元的单键;或如果(A)包含(IIIb)单元,则R 2或R 2可以为氧代,亚氨基或亚甲基。 NCC(R1)C(R2)=式(IVa)或(IVb)的基团; A- =酸阴离子还包括以下独立权利要求:(1)混合物的制备; (2)含有酸性铜的电镀液的混合物。

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