Process for selecting a mask producer for a photomask for semiconductor wafer processing compares at least two masks

摘要

A process for selecting a mask producer for semiconductor wafer photomask production from at least two masks comprises storing a maximum surface pattern for each, storing the relative cost based on the area ratio for the patterns, storing the specification data, finding the pattern forming ratio and selecting a mask on the basis of the price. An Independent claim is also included for an additional process using many patterns.