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Empty tank replacement method for resist tank used in semiconductor photolithography system has capacitive level and bubble sensors and machine readable code on tank
Empty tank replacement method for resist tank used in semiconductor photolithography system has capacitive level and bubble sensors and machine readable code on tank
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机译:半导体光刻系统中用于抗蚀剂罐的空罐更换方法,在罐上具有电容式液位和气泡传感器以及机器可读代码
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摘要
A capacitive level sensor (16) and bubble sensor (15) determine whether the resist tank (2) is empty or sufficiently full. The photolithography system (1) is paused on detection of an 'empty' signal or when a 'full' signal is not detected to allow insertion of a replacement tank. A machine readable code on the tank is scanned prior to insertion and compared with a correct code stored in a database (25). The system will only restart if the codes match. An independent claim is included for an apparatus for carrying out the method.
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