首页> 外国专利> Empty tank replacement method for resist tank used in semiconductor photolithography system has capacitive level and bubble sensors and machine readable code on tank

Empty tank replacement method for resist tank used in semiconductor photolithography system has capacitive level and bubble sensors and machine readable code on tank

机译:半导体光刻系统中用于抗蚀剂罐的空罐更换方法,在罐上具有电容式液位和气泡传感器以及机器可读代码

摘要

A capacitive level sensor (16) and bubble sensor (15) determine whether the resist tank (2) is empty or sufficiently full. The photolithography system (1) is paused on detection of an 'empty' signal or when a 'full' signal is not detected to allow insertion of a replacement tank. A machine readable code on the tank is scanned prior to insertion and compared with a correct code stored in a database (25). The system will only restart if the codes match. An independent claim is included for an apparatus for carrying out the method.
机译:电容式液位传感器(16)和气泡传感器(15)确定抗蚀剂储罐(2)是空的还是足够满的。在检测到“空”信号时或在未检测到“满”信号时暂停光刻系统(1),以允许插入替换槽。在插入之前先扫描储罐上的机器可读代码,并将其与存储在数据库中的正确代码进行比较(25)。仅当代码匹配时,系统才会重新启动。包括用于执行该方法的设备的独立权利要求。

著录项

  • 公开/公告号DE10317268A1

    专利类型

  • 公开/公告日2004-11-04

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2003117268

  • 申请日2003-04-14

  • 分类号H01L21/30;H01L21/66;G01F23/00;G05B9/02;G05B23/02;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:20

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