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Cleaning of annealed silicon wafer by oxidizing silicon wafer with ozonized water, and cleaning the oxidized silicon wafer with hydrofluoric acid

机译:用臭氧水氧化硅晶片,然后用氢氟酸清洗氧化硅晶片,从而清洁退火的硅晶片

摘要

An annealed silicon wafer is cleaned by: (i) oxidizing a silicon wafer (2) with ozonized water; and (ii) cleaning the oxidized silicon wafer with hydrofluoric acid.
机译:通过以下方式清洁退火的硅片:(i)用臭氧水氧化硅片(2); (ii)用氢氟酸清洗氧化的硅晶片。

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