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Carburation of silicon surfaces by a gas cluster ion beam, notably for the preparation of such surfaces for the integration of micro-electronic and opto-electronic devices by epitaxy
Carburation of silicon surfaces by a gas cluster ion beam, notably for the preparation of such surfaces for the integration of micro-electronic and opto-electronic devices by epitaxy
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机译:气体团簇离子束对硅表面的渗碳,特别是用于制备通过外延将微电子和光电器件集成在一起的硅表面
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摘要
Carburation of a silicon surface (6) consists of subjecting the surface to a beam of ions from a gaseous cluster, the ions coming from at least one condensable hydrocarbon.
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