NOVEL METAL CLUSTER AGGREGATE, POLYMETHYL METHACRYLATE-METAL CLUSTER COMPLEX, AND ITS NOVEL MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a novel metal cluster aggregate having a line width ranging from 10 to 300 nm, a polymethyl methacrylate-metal cluster complex for manufacturing the aggregate, and a method for manufacturing the same.;SOLUTION: If polymethyl methacrylate is irradiated with electron beams or is subjected to irradiation with the electron beams by applying a technique of electron beam lithography and is reacted with a metal complex, the reducing power of the metal captured into the polymethyl methacrylate can be regulated; free patterning can be performed and the polymethyl methacrylate-metal cluster complex can be obtained. When the complex is pyrolyzed, the novel metal cluster aggregate having the line width ranging from 10 to 300 nm can be obtained.;COPYRIGHT: (C)2005,JPO&NCIPI