PROCESS FOR DEPOSITING SILICON FILM AND PROCESS FOR FABRICATING DEVICE USING SILICON FILM DEPOSITION PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a process for depositing a silicon film using liquid silicon material at a low cost while enhancing uniformity of the silicon film, and also to provide a process for fabricating a device using the silicon film deposition process.;SOLUTION: In the process for depositing the silicon film on the surface of a substrate using liquid silicon material, the surface of the substrate is coated with the liquid silicon material and then irradiated with microwave thus forming the silicon film on the surface of the substrate. The process for fabricating the device uses that silicon film deposition process.;COPYRIGHT: (C)2005,JPO&NCIPI