GRAY SCALE MASK, METHOD FOR MANUFACTURING OPTICAL DEVICE, METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING GRAY SCALE MASK

摘要

PROBLEM TO BE SOLVED: To provide a high accuracy gray scale mask having transmittance approximate to a designed value.;SOLUTION: The gray scale mask is produced by forming a fine pattern on a reticle, reducing and transferring the pattern onto a wafer whose surface is coated with a resist by exposure by using an exposure transfer apparatus, developing the resist and etching the wafer by using the remaining resist as a mask. The distance S between the fine patterns is controlled to be ≥0.3 λ/NA, wherein NA is the numerical aperture of the exposure apparatus and λ is the wavelength of the light used for exposure.;COPYRIGHT: (C)2005,JPO&NCIPI