METHOD FOR DESIGNING GRAY SCALE MASK, METHOD FOR MANUFACTURING GRAY SCALE MASK AND METHOD FOR MANUFACTURING OPTICAL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for designing a gray scale mask for accurately forming an optical element having a desired shape.;SOLUTION: The method includes: unit area determining steps S1, S2 to determine a unit area on a resist to be irradiated with light having predetermined intensity corresponding to a desired resist shape and to determine a unit area on a gray scale mask having predetermined transmittance corresponding to the unit area on the resist; resist sensitivity curve determining steps S3 to S5 to determine a resist sensitivity curve which shows the relation between the transmittance of a gray scale mask and a groove depth formed in a resist when a gray scale mask with varied transmittance by unit areas on the gray scale mask is used; and a transmittance distribution determining step S6 to obtain the transmittance in each unit area on the gray scale mask by using the resist sensitivity curve and to determine the distribution of transmittance of the gray scale mask corresponding to the desired resist shape.;COPYRIGHT: (C)2006,JPO&NCIPI