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Method of manufacturing a gray-scale mask, a gray scale mask, a method for producing micro-optical elements, micro-optical element and an exposure apparatus

机译:灰度掩模的制造方法,灰度掩模,微光学元件的制造方法,微光学元件和曝光装置

摘要

PROBLEM TO BE SOLVED: To improve the accuracy of transmittance of a gray scale mask beyond the resolution of a mask drawing device when the gray scale mask is manufactured.;SOLUTION: A design shape area A1 is defined according to a predetermined transmittance. A first opening area A2 is defined by rounding the design shape area A1 according to the resolution of the mask drawing device while maintaining the similarity relation with the design shape area A1. A difference is calculated by subtracting the area of the first opening area A2 from the area of the design shape area A1. An area adjusting area A4 corresponding to the difference is disposed adjacently to the first opening area A2 so that the width W1 is integer times the minimum drawing unit of the mask drawing device, thereby defining a second opening area A5 consisting of the first opening area A2 and area adjusting area A4. An opening is formed in a light shielding film along the second opening area A5 by the mask drawing device.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:在制造灰度掩模时,将灰度掩模的透射率的精度提高到掩模绘制装置的分辨率以上;解决方案:根据预定的透射率定义设计形状区域A1。通过在保持与设计形状区域A1的相似关系的同时根据掩模绘制装置的分辨率对设计形状区域A1进行四舍五入来限定第一开口区域A2。通过从设计形状区域A1的面积中减去第一开口面积A2的面积来计算差。对应于该差异的区域调整区域A4与第一开口区域A2相邻设置,使得宽度W1是掩模绘制装置的最小绘制单位的整数倍,从而限定了由第一开口区域A2组成的第二开口区域A5。区域调整区域A4。利用掩模描绘装置在遮光膜上沿着第二开口区域A5形成开口。版权所有:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP5445116B2

    专利类型

  • 公开/公告日2014-03-19

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20090292158

  • 发明设计人 吉川 政樹;

    申请日2009-12-24

  • 分类号G03F1/00;G03F1/68;G02B5/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:14:41

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