Ni-Cr-Si ALLOY BASED AND Ni-Cr-Si-Cu ALLOY BASED ELECTRODE FILM, AND SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide an electrode film in which, compared with the conventional Ni-40 to 50 mass%Cr alloy film formed as a first layer in an internal electrode and the conventional Cr film formed as a first layer in an external electrode, electrical conductivity and adhesive strength are equal or more excellent, and the relaxation of the environmental problem caused by Cr is considered, and to provide a sputtering target used for forming the electrode film, and having excellent magnetic properties.;SOLUTION: An Ni-Cr-Si alloy having a composition comprising, by mass, 1 to 20% Cr and 1 to 10% Si, and the balance Ni, or is an Ni-Cr-Si-Cu alloy having a composition comprising 1 to 20% Cr, 1 to 10% Si and 1 to 10% Cu, and the balance Ni. Further, the saturation magnetization 4πI thereof is preferably controlled to ≤200 G.;COPYRIGHT: (C)2005,JPO&NCIPI