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VACUUM DEPOSITION SYSTEM AND METHOD FOR SUPPLYING VAPOR DEPOSITION MATERIAL TO VACUUM DEPOSITION SYSTEM
VACUUM DEPOSITION SYSTEM AND METHOD FOR SUPPLYING VAPOR DEPOSITION MATERIAL TO VACUUM DEPOSITION SYSTEM
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机译:真空沉积系统和将气相沉积材料提供给真空沉积系统的方法
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摘要
PROBLEM TO BE SOLVED: To provide a vacuum deposition system capable of removing air and impurities in a vapor deposition material packed into a crucible in order to obtain a good-quality vapor deposition film in vacuum deposition and supplying the degassed vapor deposition material into the crucible disposed in an evaporation chamber in the state of maintaining the vacuum of the evaporation chamber of a vacuum deposition system and a method for supplying the vapor deposition material.;SOLUTION: The vacuum deposition system comprises a housing vessel including a degassing port and degassing valve for removing the gas, such as air, from the the vapor deposition material housed in a housing vessel, a filling port and filling valve for filling the vapor deposition material into the housing vessel while removing the gas therefrom, and a supplying port and supplying valve for discharging the vapor deposition material filled into the housing vessel, a hermetic temporary storage vessel connectable with the housing vessel, and a vapor deposition material supplying section communicating with the crucible arranged in the evaporation chamber.;COPYRIGHT: (C)2005,JPO&NCIPI
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