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VACUUM DEPOSITION SYSTEM AND METHOD FOR SUPPLYING VAPOR DEPOSITION MATERIAL TO VACUUM DEPOSITION SYSTEM

机译:真空沉积系统和将气相沉积材料提供给真空沉积系统的方法

摘要

PROBLEM TO BE SOLVED: To provide a vacuum deposition system capable of removing air and impurities in a vapor deposition material packed into a crucible in order to obtain a good-quality vapor deposition film in vacuum deposition and supplying the degassed vapor deposition material into the crucible disposed in an evaporation chamber in the state of maintaining the vacuum of the evaporation chamber of a vacuum deposition system and a method for supplying the vapor deposition material.;SOLUTION: The vacuum deposition system comprises a housing vessel including a degassing port and degassing valve for removing the gas, such as air, from the the vapor deposition material housed in a housing vessel, a filling port and filling valve for filling the vapor deposition material into the housing vessel while removing the gas therefrom, and a supplying port and supplying valve for discharging the vapor deposition material filled into the housing vessel, a hermetic temporary storage vessel connectable with the housing vessel, and a vapor deposition material supplying section communicating with the crucible arranged in the evaporation chamber.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:要解决的问题:提供一种真空沉积系统,该系统能够去除包装在坩埚中的气相沉积材料中的空气和杂质,从而在真空沉积中获得高质量的气相沉积膜并将脱气后的气相沉积材料供应到坩埚中保持真空沉积系统的蒸发室的真空的状态下设置在蒸发室中的方法和用于提供气相沉积材料的方法。解决方案:真空沉积系统包括一个容纳容器,该容器包括脱气口和用于脱气的脱气阀。从容纳在容纳容器中的蒸镀材料中去除诸如空气之类的气体,用于将气相沉积材料填充到容纳容器中同时从中移除气体的填充口和填充阀,以及用于从容纳容器中移除气体的供给口和供给阀。排出填充到容纳容器中的气相沉积材料,连接一个密封的临时存储容器能够与容纳容器配合使用,并且具有与坩埚连通的蒸镀材料供应部分,其布置在蒸发室中。版权所有:(C)2005,JPO&NCIPI

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