首页> 外国专利> MULTITARGET SIMULTANEOUS LASER ABLATION DEPOSITION SYSTEM, AND TARGET HOLDER FOR THE ABLATION DEPOSITION THEREFOR

MULTITARGET SIMULTANEOUS LASER ABLATION DEPOSITION SYSTEM, AND TARGET HOLDER FOR THE ABLATION DEPOSITION THEREFOR

机译:多目标同时激光烧蚀沉积系统及其目标保持器

摘要

PROBLEM TO BE SOLVED: To provide a multitarget simultaneous pulse laser ablation deposition system (MTS-PLAD) and a target holder for the system.;SOLUTION: The target holder comprises: a target rotation means for uniformly ablating a target; a direction change regulation means for the target rotation axis for directing a plasma plume emitted, by the ablation of target substance, to a direction vertical to the target face toward a substrate; and a flange to fix the target holder to a chamber. Further, a plurality of target holders, or a single flange multiple target holder provided with a plurality of functions of target holders are fitted to the chamber. By using a plurality of laser beams, the plurality of targets are simultaneously or alternately ablated. In the film deposition, additives for fabricating a semiconductor can simultaneously be doped, the correct compositional control in the film of multielemental components is made possible, and further the film deposition having reduced impurity grains and compositional variation and further having a wider area can be realized.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种多靶同时脉冲激光烧蚀沉积系统(MTS-PLAD)和用于该系统的靶支架;解决方案:该靶支架包括:用于均匀地消融靶的靶旋转装置;以及用于旋转靶的靶旋转装置。用于目标旋转轴的方向改变调节装置,用于将通过烧蚀目标物质而发射的等离子体羽流引导至垂直于目标面朝向基板的方向;法兰将靶架固定在腔室上。此外,将具有多个目标保持器的功能的多个目标保持器或单个凸缘的多个目标保持器装配到腔室。通过使用多个激光束,同时或交替地烧蚀多个目标。在膜沉积中,可以同时掺杂用于制造半导体的添加剂,可以在多元素组分的膜中进行正确的成分控制,并且还可以实现具有减少的杂质颗粒和成分变化并且还具有更大面积的膜沉积。 。;版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005068536A

    专利类型

  • 公开/公告日2005-03-17

    原文格式PDF

  • 申请/专利号JP20030304150

  • 发明设计人 MUTO HACHIZO;

    申请日2003-08-28

  • 分类号C23C14/28;C23C14/34;G11B7/26;H01L21/203;

  • 国家 JP

  • 入库时间 2022-08-21 22:34:44

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