SAMPLE INSPECTION METHOD, ITS DEVICE, CLUSTER TOOL FOR MANUFACTURING MICROELECTRONICS DEVICE, AND DEVICE FOR MANUFACTURING MICROELECTRONICS DEVICE

摘要

PROBLEM TO BE SOLVED: To perform sample inspection with high sensitivity and high throughput.;SOLUTION: This sample inspection method includes irradiating a sample with a pleochroic beam of X rays including X-ray photons having photon energy within one range. X rays scattered from the sample are received at a plurality of scattering angles by using one or more sensors for generating output signals denoting photon energy of each of X-ray photons entering the sample. The output signals are analyzed based on the photon energy to determine the scatter profile of the sample based on photon energy selected within the above range.;COPYRIGHT: (C)2005,JPO&NCIPI