首页> 外国专利> BISMUTH LAYER-LIKE PEROVSKITE STRUCTURE FERROELECTRIC THIN FILM ELEMENT AND MANUFACTURING METHOD THEREFOR

BISMUTH LAYER-LIKE PEROVSKITE STRUCTURE FERROELECTRIC THIN FILM ELEMENT AND MANUFACTURING METHOD THEREFOR

机译:铋层状钙钛矿结构铁电薄膜元件及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a bismuth layer-like perovskite structure ferroelectric thin film having a desired composition without a hetero-phase, and to provide the bismuth layer-like perovskite structure ferroelectric thin film superior in crystallinity.;SOLUTION: The manufacturing method includes a substrate 10, a conductive thin film 12 formed on the substrate 10, and an oriented ferroelectric thin film 14 of oxide which is formed on the conductive thin film 12 and has a bismuth layer-like perovskite structure. The ferroelectric thin film 14 is formed on the conductive thin film 12, and has a layer 140 (a base layer and a composition change layer if they are suitable) where a composition gradually changes from a conductive thin film interface toward an upper layer side in a film thickness direction, and a layer 141 which succeeds the layer 140 and whose composition is constant.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种具有所需组成且无异相的铋层状钙钛矿结构铁电薄膜的制造方法,并提供结晶度优异的铋层状钙钛矿结构铁电薄膜。 :该制造方法包括基板10,形成在基板10上的导电薄膜12以及形成在导电薄膜12上并且具有铋层状钙钛矿结构的定向的氧化物铁电薄膜14。铁电薄膜14形成在导电薄膜12上,并且具有层140(基层和成分改变层,如果合适的话),其中成分从导电薄膜界面朝着上层侧逐渐变化。膜厚度方向,以及层141,该层141接在层140之后,且其成分恒定。COPYRIGHT:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005044917A

    专利类型

  • 公开/公告日2005-02-17

    原文格式PDF

  • 申请/专利权人 JAPAN STEEL WORKS LTD:THE;

    申请/专利号JP20030201574

  • 发明设计人 SANO KAZUYA;KATO KEIKO;

    申请日2003-07-25

  • 分类号H01L27/105;C23C16/40;H01L21/316;

  • 国家 JP

  • 入库时间 2022-08-21 22:32:34

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