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MINUTE ELECTROMECHANICAL SYSTEM STRUCTURE AND ITS MANUFACTURING METHOD

机译:微型机电系统结构及其制造方法

摘要

PPROBLEM TO BE SOLVED: To provide a minute electromechanical system structure which is made suitable for an optical interference display cell and to provide a manufacturing method of the same. PSOLUTION: Structure of an optical interference display cell includes a first electrode, a second electrode and a post. The second electrode includes a conductor layer covered by a material layer, and is arranged approximately parallel with the first electrode. A support is arranged between the first and second plates to form a gap. In a release etching method used to manufacture the structure, the material layer protects the conductor layer from the damage which may be caused by etching agent. The material layer also protects the conductor layer from the damage which may be caused by oxygen and moisture in the air. PCOPYRIGHT: (C)2005,JPO&NCIPI
机译:

要解决的问题:提供适合于光学干涉显示单元的微小的机电系统结构,并提供其制造方法。解决方案:光学干涉显示单元的结构包括第一电极,第二电极和柱。第二电极包括被材料层覆盖的导体层,并且被布置成与第一电极大致平行。支撑件布置在第一板和第二板之间以形成间隙。在用于制造结构的释放蚀刻方法中,材料层保护导体层不受蚀刻剂可能引起的损坏。材料层还保护导体层免受空气中的氧气和湿气可能引起的损坏。

版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005107482A

    专利类型

  • 公开/公告日2005-04-21

    原文格式PDF

  • 申请/专利权人 PRIME VIEW INTERNATL CO LTD;

    申请/专利号JP20040102022

  • 发明设计人 LIN WEN-JIAN;

    申请日2004-03-31

  • 分类号G02B26/00;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:59

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