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METHOD OF GROWING CRYSTAL, METHOD OF MANUFACTURING SEMICONDUCTOR LASER, AND CRYSTAL GROWING DEVICE

机译:晶体生长方法,半导体激光器的制造方法以及晶体生长装置

摘要

PROBLEM TO BE SOLVED: To provide a method of growing crystal by which crystalline compound semiconductor films having good crystal qualities can be formed in different thicknesses in the same substrate.;SOLUTION: The method of growing crystal includes a step of mounting a given substrate 60 on a substrate mounting member 50 housed in a deposition chamber 10, and a step of growing compound semiconductor crystals on the substrate 60 while the substrate 60 is heated in the deposition chamber 10. The substrate mounting member 50 is provided with a temperature distribution imparting area 52 on its surface for mounting the substrate 60. The compound semiconductor crystals are grown on the crystal growing surface of the substrate 60 while a prescribed temperature distribution is produced on the surface by heating the substrate 60 through the temperature distribution imparting area 52.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种生长晶体的方法,通过该方法可以在同一衬底中以不同的厚度形成具有良好晶体质量的晶体化合物半导体膜。;解决方案:生长晶体的方法包括安装给定衬底60的步骤。在沉积室10中容纳的基板安装构件50上进行加热;以及在沉积室10中加热基板60的同时在基板60上生长化合物半导体晶体的步骤。基板安装构件50设有温度分布赋予区域52在其上用于安装衬底60的表面上。化合物半导体晶体在衬底60的晶体生长表面上生长,同时通过通过温度分布赋予区域52加热衬底60在表面上产生规定的温度分布。 :(C)2005,日本特许厅

著录项

  • 公开/公告号JP2004356167A

    专利类型

  • 公开/公告日2004-12-16

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20030148903

  • 发明设计人 NISHIDA TETSURO;

    申请日2003-05-27

  • 分类号H01L21/205;H01L21/203;H01S5/16;H01S5/22;H01S5/343;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:48

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