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FRESNEL ZONE PLATE, AND INSTRUMENT AND METHOD FOR MEASURING X-RAY DIFFRACTION

机译:菲涅耳带片以及测量X射线衍射的仪器和方法

摘要

PROBLEM TO BE SOLVED: To provide an instrument and a method of high precision and high sensitivity for measuring X-ray diffraction having 0.1 μm order of spatial resolution.;SOLUTION: A concentric circular FZP pattern portion 101 is provided on a Ta film on an SiN film by an electron beam drawing technique or the like to form a Fresnel zone plate (FZP) 100. X-ray non-transmission processing by gold plating is executed in the central portion 102 and a peripheral portion of the FZP 100 to irradiate a sample 106 with only light condensed while avoiding an influence of direct light. An incident X-ray beam 104 is made to get incident into the FZP 100, and a Bessel beam 107 formed in a transmission beam is emitted onto a measuring objective area of the sample 106. The unnecessary diffraction X-ray included in the diffraction X-ray beam is removed by a pinhole 109, and only diffraction light 108 from the irradiation area of the Bessel beam on the sample 106 is made to get incident into a detector 110, so as to measure intensity thereof.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于测量具有0.1μm空间分辨率的X射线衍射的高精度和高灵敏度的仪器和方法。解决方案:同心圆形FZP图案部分101设置在Ta膜上通过电子束拉伸技术等在SiN膜上形成菲涅耳波带片(FZP)100。在FZP 100的中心部分102和外围部分执行通过镀金的X射线非透射处理,仅聚光地照射样品106,同时避免直射光的影响。使入射的X射线束104入射到FZP 100中,并且在透射束中形成的贝塞尔光束107被发射到样品106的测量目标区域上。衍射X中包括的不必要的衍射X射线通过针孔109去除X射线束,并且仅使来自样品106上的贝塞尔光束的照射区域的衍射光108入射到检测器110中,以测量其强度。版权:(C) 2005,日本特许厅

著录项

  • 公开/公告号JP2004340640A

    专利类型

  • 公开/公告日2004-12-02

    原文格式PDF

  • 申请/专利权人 FUJI ELECTRIC HOLDINGS CO LTD;

    申请/专利号JP20030135124

  • 发明设计人 TANUMA RYOHEI;

    申请日2003-05-13

  • 分类号G21K1/06;G01N23/20;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:30

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