NEW METHOD OF FABRICATION FRESNEL ZONE PLATE FORHARD X-RAY RADIATION

摘要

We present the first results of fabrication the circular zone plate by means of high resolution negative tone inorganic HSQ (Hydrogen Silsesquioxane or XR-1541) electron-beam resist. Fresnel zone plates (FZPs) has been fabricated on the surface of silicon crystals for the energy from 8keV up to l00keV by electron beam lithography. Three different FZPs have been fabricated; circular FZP for the first diffraction order, circular compound FZP for the first and third diffraction order, and linear FZP for the first and second diffraction order. The parameters of the compound FZPs for first and third order were the following: the focal distance of first and third orders FZP is F =13.229cm for 0.1 nm wavelength, the entire aperture is 400.0016μm, the width of the outermost zones of the first and third orders is l00nm, and the number oi the first and third order zones is 1223.