首页> 外国专利> MAGNETORESISTANCE EFFECT ELEMENT, DEVICE HAVING MAGNETORESISTANCE EFFECT ELEMENT, DEVICE COMPRISING NANOCONTACT STRUCTURE, AND MANUFACTURING METHOD OF NANO CONTACT STRUCTURE

MAGNETORESISTANCE EFFECT ELEMENT, DEVICE HAVING MAGNETORESISTANCE EFFECT ELEMENT, DEVICE COMPRISING NANOCONTACT STRUCTURE, AND MANUFACTURING METHOD OF NANO CONTACT STRUCTURE

机译:磁阻效应元件,具有磁阻效应元件的设备,包含纳米接触结构的设备以及纳米接触结构的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a magnetoresistance effect element capable of stably obtaining very high changes in resistance, and to provide its manufacturing method.;SOLUTION: The magnetoresistance effect element 10 comprises an antiferromagnetism layer 13, a pin layer 12, combined with this antiferromagnetism layer 13 in switched connection, a free layer 14 in which magnetism is rotated or switched by magnetic field of medium, and an interlayer 20 between the free layer and the pin layer 12. The interlayer 20 comprises magnetism particles 16, surrounded by an insulating body 18. Further, these magnetism particles 16 have the free layer 14 and the pin layer 12 connected in nano contact.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种能够稳定地获得非常高的电阻变化的磁阻效应元件,并提供其制造方法。解决方案:磁阻效应元件10包括反铁磁层13,pin层12,并与之结合。开关连接中的反铁磁性层13,通过介质的磁场旋转或转换磁性的自由层14,以及在自由层和pin层12之间的中间层20。中间层20包括被绝缘体包围的磁性颗粒16此外,这些磁性粒子16具有以纳米接触方式连接的自由层14和pin层12。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005109499A

    专利类型

  • 公开/公告日2005-04-21

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP20040282705

  • 发明设计人 RACHID SBIAA;

    申请日2004-09-28

  • 分类号H01L43/08;G11B5/39;H01F10/32;H01L27/105;H01L43/10;H01L43/12;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:29

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